Senior Research Scientist
Veeco's process equipment solutions enable the manufacture of LEDs, flexible OLED displays, solar cells, power electronics, hard drives, MEMS and wireless chips. We are the market leader in LED, MBE, Ion Beam and other advanced thin film process technologies. Our high performance systems drive innovation in energy efficiency, consumer electronics and network storage and allow our customers to maximize productivity and achieve lower cost of ownership.
I am an interdisciplinary scientist with a passion for solving problems in surface science, material characterization, optics/spectroscopy, thin films, and optical materials. I have expertise in custom measurement setups (especially optical measurement setups), data analysis (via Matlab, OriginPro, JMP), advanced characterization, electromagnetic modeling, semiconductor fabrication, nanofabrication/thin-film deposition, and optics. More specifically, I have significant levels of experience in the following (as an example): - Spectroscopy: Photoluminescence (PL), ellipsometry. electroluminescence (EL), scatterometry, FT-Infrared Spectroscopy (FT-IR) (Various modes including RAIRS, microscope attachment, etc), UV-vis Spectroscopy, Hemispherical Directional Reflectance/Transmittance. - X-ray Diffraction: RSM, XRR, pole figures, rocking curves, omega-2theta, grazing incidence x-ray diffraction(GIXRD) scans - Scanning Probe Microscopy and other surface analysis techniques: Tapping Mode AFM, Contact mode AFM, Peak force tapping mode AFM, STM, Near-field Scanning Optical Microscopy), Contact Angle measurement. - Optics: Visible and Infrared Lasers, Laser Beam Profiling/alignment, - Thin film deposition, semiconductor fabrication techniques, and other processing techniques: self-assembled monolayers, Physical Vapor Deposition (electron beam deposition, sputtering deposition), Electron-beam/optical Lithography, Electroplating, Spin Coating (of various polymers/resist), Electrochemical Etching, Nanomaterial Synthesis Techniques, - Trace Metal Analysis and doping level measurement: Inductively Coupled Plasma Optical Emission Spectrometry (ICP-OES). Hall measurement, Electrochemical CV (ECV). - Microscopy: Scanning Electron Microscopy (SEM), 3D Laser optical microscopes. , - Electrical characterization: Hall measurement. - Electromagnetic simulation (finite element method): COMSOL Multiphysics, HFSS, etc Email: eztucker.chem@gmail.com
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